Object

Title: Computer simulation studies of roughness of thin films formed in the ion beam assisted deposition (IBAD) process

Creator:

Oleszkiewicz, Waldemar ; Romiszowski, Piotr

Contributor:

Gaj, Miron. Redakcja ; Wilk, Ireneusz. Redakcja

Description:

Optica Applicata, Vol. 35, 2005, nr 3, s. 495-501

Abstrakt:

In this study we present Monte Carlo simulation studies of thin films deposited in the ion beam assisted deposition (IBAD) process. The simulations were performed on a simple cubic lattice with the Metropolis sampling algorithm. Examination of the microstructure and morphology of the simulated film shows that the processes of the surface diffusion of adatoms and the sputtering of the film during its growth as a result of the ion bombardment significantly influence the structure of the deposited layer. The presented simulation model enables one to determine the importance and the influence of these processes on the final structure of the film.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2005

Resource Type:

artykuł

Resource Identifier:

oai:dbc.wroc.pl:72838

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 35, 2005 ; Optica Applicata, Vol. 35, 2005, nr 3 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska

Group publication title:

Optica Applicata

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