Title:

Properties of transparent oxide thin films prepared by plasma deposition

Group publication title:

Optica Applicata

Creator:

Domaradzki, Jarosław ; Borkowska, Agnieszka ; Kaczmarek, Danuta ; Prociów, Eugeniusz L.

Contributor:

Gaj, Miron. Redakcja ; Wilk, Ireneusz. Redakcja

Subject and Keywords:

optyka ; transparent thin film ; sputtering process ; titanium oxide ; hot target

Description:

Optica Applicata, Vol. 35, 2005, nr 3, s. 425-430

Abstrakt:

In this paper, thin films of TiO2 were deposited onto (100) oriented silicon and glass substrates using low pressure hot target reactive magnetron sputtering (LP HTRS) method. X-ray diffraction (XRD) and optical transmission measurements have been applied to study the influence of substrate type on the microstructure and optical properties of the prepared thin films, respectively. Thin films exhibit the TiO2-anatase crystalline state, which could be confirmed by the appearance of peaks of (101) orientation.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2005

Resource Type:

artykuł

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 35, 2005 ; Optica Applicata, Vol. 35, 2005, nr 3 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska