TY - GEN N1 - Optica Applicata, Vol. 36, 2006, nr 4, s. 593-600 N2 - In this paper an application of a recently developed laser plasma source of extreme ultraviolet (EUV) for optical measurements of optical characteristics of Mo/Si multilayer mirrors is presented. The source is based on an xenon-helium double-stream gas puff target irradiated with laser pulses from a Nd : YAG laser system (E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry. L1 - http://www.dbc.wroc.pl/Content/64425/optappl_3604p593.pdf M3 - artykuł L2 - http://www.dbc.wroc.pl/Content/64425 PY - 2006 KW - optyka KW - laser-produced plasma extreme ultraviolet (EUV) source KW - gas puff target KW - Mo/Si mirrors KW - EUV spectroscopy C1 - Wszystkie prawa zastrzeżone (Copyright) A1 - Rakowski, R. A1 - Bartnik, A. A1 - Fiedorowicz, H. A1 - Jarocki, R. A1 - Kostecki, J. A1 - Krzywiński, J. A1 - Mikołajczyk, J. A1 - Pina, L. A1 - Ryc, L. A1 - Szczurek, M. A1 - Ticha, H. A1 - Wachulak, P. A2 - Gaj, Miron. Redakcja A2 - Wilk, Ireneusz. Redakcja PB - Oficyna Wydawnicza Politechniki Wrocławskiej C6 - Dla wszystkich w zakresie dozwolonego użytku LA - eng CY - Wrocław T1 - Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target UR - http://www.dbc.wroc.pl/dlibra/publication/edition/64425 ER -