Three-dimensional microstructures of photoresist formed by gradual gray-scale lithography approach - Luo, Ningning; Gao, Yiqing; Zhimin, Zhang; Mengchao, Xiao; Huaming, Wu (Oficyna Wydawnicza Politechniki Wrocławskiej, 2012)
Optica Applicata, Vol. 42, 2012, Nr 4, s. 845-852
Keywords: optyka; gradual gray-scale lithography; DMD pixel error; axicon array; microlens array