Exposition time analysis of AlGaN/GaN HEMT fabrication by electron beam lithography - Indykiewicz, Kornelia; Paszkiewicz, Bogdan; Paszkiewicz, Regina (Oficyna Wydawnicza Politechniki Wrocławskiej, 2019)
Optica Applicata, Vol. 49, 2019, nr 1, s. 161-166
Keywords: optyka; electron beam lithography (EBL); device fabrication; exposition time reduction