@misc{Proszyński_Adam_Measurement_2005,
 author={Proszyński, Adam and Chocyk, Dariusz and Gładyszewski, Grzegorz and Pieńkos, Tomasz and Gładyszewski, Longin},
 contributor={Gaj, Miron. Redakcja and Wilk, Ireneusz. Redakcja},
 year={2005},
 rights={Wszystkie prawa zastrzeżone (Copyright)},
 publisher={Oficyna Wydawnicza Politechniki Wrocławskiej},
 description={Optica Applicata, Vol. 35, 2005, nr 3, s. 517-522},
 language={eng},
 abstract={Stress measurements of 23 nm copper films and 93 nm silver films on Si (100) have been performed during thermal cycling between RT and 450°C. The changes in stress versus temperature are interpreted. The effects of treatment on microstructure and composition are studied by X-ray diffraction.},
 title={Measurement of stress as a function of temperature in Ag and Cu thin films},
 type={artykuł},
 keywords={optyka, annealing, stress measurements, thin films},
}