@misc{Bielecki_Zbigniew_Energy_2007,
 author={Bielecki, Zbigniew and Mikołajczyk, Janusz},
 contributor={Gaj, Miron. Redakcja},
 year={2007},
 rights={Wszystkie prawa zastrzeżone (Copyright)},
 publisher={Oficyna Wydawnicza Politechniki Wrocławskiej},
 description={Optica Applicata, Vol. 37, 2007, nr 1-2, s. 83-92},
 language={eng},
 abstract={The authors demonstrate a detection system of EUV radiation pulses. The system provides energy measurements with uncertainty of 7.3% in the range of wavelengths 13.5 ± 0.5 nm (FWHM = 7.3%). The calibration of the system was taken using the E-Mon commercial meter and a laser-plasma source. The procedures made it possible to determine a calibration factor for the laser-plasma source with helium-xenon gas puff target. The factor is exploited for the purpose of standardizing measurements of EUV radiation with FWHM = 2%. A substantial improvement in the system responsivity is demonstrated.},
 title={Energy meter system for gas-puff laser plasma},
 type={artykuł},
 keywords={optyka, EUV radiation, EUV energy meter, nanolithography},
}