@misc{Stafiniak_Andrzej_Properties_2009,
 author={Stafiniak, Andrzej and Muszyńska, Donata and Szyszka, Adam and Paszkiewicz, Bogdan and Ptasiński, Konrad and Patela, Sergiusz and Paszkiewicz, Regina and Tłaczała, Marek},
 contributor={Gaj, Miron. Redakcja and Urbańczyk, Wacław. Redakcja},
 year={2009},
 rights={Wszystkie prawa zastrzeżone (Copyright)},
 publisher={Oficyna Wydawnicza Politechniki Wrocławskiej},
 description={Optica Applicata, Vol. 39, 2009, nr 4, s. 717-722},
 language={eng},
 abstract={In this paper, the results of investigation of the influence of cathode current on optical and dielectric AlNx thin-film properties are presented. AlNx films were prepared by pulsed DC reactive magnetron sputtering of Al target on substrates at room temperature. For characterization of fabricated test structures C-V spectroscopy, ellipsometry measurement and atomic force microscopy (AFM) were used.},
 title={Properties of AlNx thin films prepared by DC reactive magnetron sputtering},
 type={artykuł},
 keywords={optyka, aluminum nitride (AlN), thin films, reactive magnetron sputtering, alternative dielectrics},
}