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Search for: [Abstrakt = "In this paper an application of a recently developed laser plasma source of extreme ultraviolet \(EUV\) for optical measurements of optical characteristics of Mo\/Si multilayer mirrors is presented. The source is based on an xenon\-helium double\-stream gas puff target irradiated with laser pulses from a Nd \: YAG laser system \(E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5\). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry."]

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Optica Applicata

Rakowski, R. Bartnik, A. Fiedorowicz, H. Jarocki, R. Kostecki, J. Krzywiński, J. Mikołajczyk, J. Pina, L. Ryc, L. Szczurek, M. Ticha, H. Wachulak, P. Gaj, Miron. Redakcja Wilk, Ireneusz. Redakcja

2006
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