Search for: [Abstrakt = "In this paper an application of a recently developed laser plasma source of extreme ultraviolet \(EUV\) for optical measurements of optical characteristics of Mo\/Si multilayer mirrors is presented. The source is based on an xenon\-helium double\-stream gas puff target irradiated with laser pulses from a Nd \: YAG laser system \(E = 0.55 J, t = 3.9 ns, f = 10 Hz, M 2 = 2.5\). The results show that the source can be useful for EUV lithography technologies as a metrology tool in the semiconductor industry."]